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Cu Copper - Sputtering Target

Copper is reddish and takes on a bright metallic luster. It is malleable, ductile, and a good conductor of heat and electricity (second only to silver in electrical conductivity).

Melting point: 1084.6 °C Boiling point: 2562 °C

A sputtering target is essentially a disc made from a high-purity material, specifically designed to serve as an atomic sputtering source during ion beam bombardment processes. These sputter targets play a crucial role in various applications, including thin film deposition and materials science research. If you find that the size or purity of the sputtering target you need is not included in our current listings, please do not hesitate to reach out to us for assistance. We are here to help!

Sputtering Target Sputtering Target

Copper - Sputtering Target - Your product selection

Cu-00100 Copper sputtering target

Details: diam. 10mm x 0.5mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00101 Copper sputtering target

Details: diam. 10mm x 1mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00102 Copper sputtering target

Details: diam. 10mm x 2mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00103 Copper sputtering target

Details: diam. 10mm x 3.175mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00104 Copper sputtering target

Details: diam. 10mm x 4mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00105 Copper sputtering target

Details: diam. 10mm x 6.35mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00106 Copper sputtering target

Details: diam. 25.4mm x 0.5mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00107 Copper sputtering target

Details: diam. 25.4mm x 1mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00108 Copper sputtering target

Details: diam. 25.4mm x 2mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00109 Copper sputtering target

Details: 99.999% purity also available; OFHC available
Purity: 99.99%
CAS No: [7440-50-8]
Further information: diam. 25.4mm x 3.175mm thickness

Cu-00110 Copper sputtering target

Details: diam. 25.4mm x 6.35mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00111 Copper sputtering target

Details: diam. 50.8mm x 0.5mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00112 Copper sputtering target

Details: diam. 50.8mm x 1mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00113 Copper sputtering target

Details: diam. 50.8mm x 2mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00114 Copper sputtering target

Details: diam. 50.8mm x 3.175mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00115 Copper sputtering target

Details: diam. 50.8mm x 6.35mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00116 Copper sputtering target

Details: diam. 76.2mm x 0.5mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00117 Copper sputtering target

Details: diam. 76.2mm x 1mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00118 Copper sputtering target

Details: diam. 76.2mm x 2mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00119 Copper sputtering target

Details: diam. 76.2mm x 3.175mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00120 Copper sputtering target

Details: diam. 76.2mm x 6.35mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00121 Copper sputtering target

Details: diam. 101.6mm x 0.5mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00122 Copper sputtering target

Details: diam. 101.6mm x 1mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00123 Copper sputtering target

Details: diam. 101.6mm x 2mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00124 Copper sputtering target

Details: diam. 101.6mm x 3.175mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

Cu-00125 Copper sputtering target

Details: diam. 101.6mm x 6.35mm thickness
Purity: 99.99%
CAS No: [7440-50-8]
Further information: 99.999% purity also available; OFHC available

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