Ge Germanium - Sputtering Target

The element is a gray-white metalloid. In pure state, the element is crystalline and brittle, retaining its luster in air at room temperature. It is a very important semiconductor. Zone-refining techniques have led to production of crystalline germanium for semiconductor use with an impurity of only one part in 1010.

Melting point: 938.25 °C Boiling point: 2833 °C

A sputtering target is essentially a disc made from a high-purity material, specifically designed to serve as an atomic sputtering source during ion beam bombardment processes. These sputter targets play a crucial role in various applications, including thin film deposition and materials science research. If you find that the size or purity of the sputtering target you need is not included in our current listings, please do not hesitate to reach out to us for assistance. We are here to help!