Hf Hafnium - Sputtering Target

Hafnium is a ductile metal with a brilliant silver luster. Its properties are considerably influenced by presence of zirconium impurities. Of all the elements, zirconium and hafnium are two of the most difficult to separate. Although their chemistry is almost identical, the density of zirconium is about half of hafnium. Very pure hafnium has been produced, with zirconium being the major impurity.

Melting point: 2233 °C Boiling point: 4603 °C

A sputtering target is a disc of a high purity material used as an atomic sputtering source for ion beam bombardment. Please contact us if your required sputtertarget size and/ or purity are not listed.