Tm Thulium - Sputtering Target

Thulium can be isolated by reduction of the oxide with lanthanum metal or by calcium reduction of a closed container. The element is silver-gray, soft, malleable, and ductile, and can be cut with a knife.

Melting point: 1545 °C Boiling point: 1950 °C

A sputtering target is essentially a disc made from a high-purity material, specifically designed to serve as an atomic sputtering source during ion beam bombardment processes. These sputter targets play a crucial role in various applications, including thin film deposition and materials science research. If you find that the size or purity of the sputtering target you need is not included in our current listings, please do not hesitate to reach out to us for assistance. We are here to help!