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Sputtering Targets - Pure Metals

EVOCHEM offers an extensive selection of high-purity metal sputtering targets, achieving purities of up to 99.9999%. To assist you effectively, please provide comprehensive information regarding the sputtering material, purity, dimensions, any specific tolerances, and the quantity needed. We are happy to create a customized quote for you.

The production techniques for metal sputtering targets differ according to the material and application specifications. These methods include vacuum melting, rolling, hot-pressing, specialized press-sintering, vacuum hot-pressing, and forging. Our standard round sputteringtargets range from 1 inch to 20 inches in diameter, while rectangular targets can extend beyond 4000mm in length, depending on the type of sputtering metal. Purity levels can vary from 99.5% to 99.9999% for certain sputtering metals, tailored to meet specific requirements. Custom designs are also available to fulfill unique needs.

Name Formula Purities
Aluminum - Sputtering Target Al 2N-5N5
Antimony - Sputtering Target Sb 4N-5N
Bismuth - Sputtering Target Bi 3N8-5N
Boron - Sputtering Target B 3N
Cadmium - Sputtering Target Cd 4N-5N
Carbon - Sputtering Target C 4N-4N5
Cerium - Sputtering Target Ce 2N-3N5 TREM: 2Nmin
Chromium - Sputtering Target Cr 2N5-3N5
Cobalt - Sputtering Target Co 3N-5N
Copper - Sputtering Target Cu 3N-4N
Dysprosium - Sputtering Target Dy 4N-5N TREM: 2N5-3N5
Erbium - Sputtering Target Er 2N-4N TREM: 2N-3N
Europium - Sputtering Target Eu 2N-3N5 TREM: 2N-3N
Gadolinium - Sputtering Target Gd 2N-4N TREM: 2N-3N
Germanium - Sputtering Target Ge 5N
Gold - Sputtering Target Au 3N-5N
Graphite - Sputtering Target C 4N-4N5
Hafnium - Sputtering Target Hf 2N6-3N
Holmium - Sputtering Target Ho 2N-4N TREM: 2N-3N
Indium - Sputtering Target In 4N-5N
Iridium - Sputtering Target Ir 3N5
Iron - Sputtering Target Fe 2N-4N
Lanthanum - Sputtering Target La 2N-3N5 TREM: 2N-2N5
Lead - Sputtering Target Pb 3N-5N
Lutetium - Sputtering Target Lu 2N-4N TREM: 2N-3N
Magnesium - Sputtering Target Mg 3N-4N
Manganese - Sputtering Target Mn 4N
Molybdenum - Sputtering Target Mo 3N5-4N
Neodymium - Sputtering Target Nd 2N-3N5 TREM: 2N-2N5
Nickel - Sputtering Target Ni 4N
Niobium - Sputtering Target Nb 2N-3N
Palladium - Sputtering Target Pd 3N5
Platinum - Sputtering Target Pt 3N5-4N
Praseodymium - Sputtering Target Pr 2N-3N TREM: 2Nmin
Rhenium - Sputtering Target Re 4N
Ruthenium - Sputtering Target Ru 4N
Samarium - Sputtering Target Sm 2N-4N TREM: 2N-3N
Scandium - Sputtering Target Sc 3N-5N TREM: 2N-3N
Selenium - Sputtering Target Se 4N
Silicon - Sputtering Target Si 4N-6N
Silver - Sputtering Target Ag 4N-5N
Tantalum - Sputtering Target Ta 3N5-4N
Tellurium - Sputtering Target Te 4N
Terbium - Sputtering Target Tb 2N-4N TREM: 2N-3N
Thulium - Sputtering Target Tm 2N-4N TREM: 2N-3N
Tin - Sputtering Target Sn 2N-4N
Titanium - Sputtering Target Ti 2N5-4N5
Tungsten - Sputtering Target W 2N-3N5
Vanadium - Sputtering Target V 2N-4N
Ytterbium - Sputtering Target Yb 2N-4N TREM: 2N-3N
Yttrium - Sputtering Target Y 2N-5N TREM: 2N-3N
Zinc - Sputtering Target Zn 4N
Zirconium - Sputtering Target Zr 2N6-3N


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